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Schoonover, Inc. |
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Vacuum Equipment - Electron Beam Equipment- Thin Film Deposition- In-Situ Optical Monitor |
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In-Situ Spectroscopic Optical Monitor |
  Model 820 In-Situ Spectroscopic Optical Monitor Features
820 Optical In-Situ Spectroscopic Optical Monitor Product Literature
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Full Spectrum Analysis - Spectrometer monitors from 400-930nm to analyze the true reflectance or transmittance of the test chips being monitored. Multiple Endpoint Techniques -The Model 820 can be configured to endpoint each layer with Pre-Quarter wave, Post-Quarter wave or Simulation Template Match. The Essential Macleod thin film design and optimization software is integrated into the Model 820 software to enable template matching. Real-time Chamber Characterization - Because the Model 820 monitors the full spectrum during the deposition process, the system can identify shifts in spectrum due to various changes in material composition and chamber parameters. The spectrum data can then be used to calculate new N&K values which can update the design of the product being produced.
The Model 820 can also characterize the optical constants of the films related to process steps, such as venting, spectral shifts due to temperature, and/or gas flow rates. Offline Stage (optional) - measurement of transmittance, reflectance or Color for QC of Filters, Prisms, or Beam Splitters. Plasma Diagnostics/Endpoint - The Model 820 software also includes the capability for control and analysis of plasma processes.
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