Solvix® DC & Pulsed Power Supply Series

• Power Range: 3–30 kW

• Modes: DC and pulsed-DC outputs

• Key Features: Best-in-class arc handling, current/power/voltage regulation modes, flexible architecture, multiple communication interfaces, and broad impedance range.

• Benefits: Reliable performance with high throughput, rugged design for industrial environments, and reduced substrate damage and process contamination. Ideal for metallic and reactive sputtering processes.

Pinnacle® DC Power Supplies

• Pinnacle III Series: Field-proven DC generators for ≤20 kW applications with superior arc management, low stored energy, fast arc response, and excellent process consistency—strong choices for production-grade PVD tools.

• Pinnacle III Plus+ Pulsed DC: Adds pulsed-DC capability for reactive sputtering of high-quality dielectric films, with adjustable frequency and duty cycle for improved film uniformity and repeatability.

Ascent® Pulsed & DC Power Systems

• Ascent AMS & AMS II: Modular pulsed/DC systems delivering stable, repeatable power with advanced arc management technology suitable for high-power magnetron sputtering and large-area coating tools.

• Ascent AP Series: Combines advanced pulse shaping and arc mitigation with wide operational range, enabling flexible process tuning for both conductive and dielectric materials.

Ascent DMS Pulsed & DC Power System (Advanced Dual-Magnetron Sputtering)

The Ascent® DMS series introduces powerful next-generation plasma power specifically optimized for dual-magnetron sputtering applications. Its modular design and advanced control features allow precision tuning of film characteristics and scalable power configurations.

Key Features:

• Modular & Scalable: Available in 40, 60, and 120 kW modules configurable up to 180 kW or more for large systems.

• Selectable Frequency: Adjustable output from approximately 500 Hz to 50 kHz.

• Duty Cycle Control: Independent power ratio regulation for each magnetron.

• Advanced Process Management: Tiered arc mitigation and synchronization features like CEX (phase synchronization) for coordinated magnetron operation.

• Flexible Communication: Ethernet, EtherCAT, Profibus, RS-232/485, EtherNet/IP, analog interfaces for tool integration.

Benefits:

• Exceptional film quality through precise tuning and repeatability

• Higher deposition rates with improved arc stability

• Lower total cost of ownership through modular scalability

• Simple system integration with flexible control interfaces

PEII® Low-Frequency Plasma Generators

The PEII series from Advanced Energy delivers low-frequency, pulse-modulated plasma power designed for robust reactive sputtering and PECVD applications where arc management, internal load matching, and flexible power delivery are critical.

Key Features:

• 40 kHz pulse width modulation (PWM) power delivery suitable for low-frequency plasma processes.

• Advanced arc control with dual arc-handling circuits to help maintain stable plasma and protect targets and substrates.

• Internal load matching, eliminating the need for external transformers or tuners, and simplifying integration.

• High power density and modular design—multiple units can be combined for higher total output up to ~60 kW.

• Regulated output modes (power, voltage, or current) for adaptable process control.

• Water-cooled design for reliable operation in demanding sputtering and coating environments.